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TERNARY NITRIDE FILMS SYNTHESIZED BY CATHODIC ARC METHOD

机译:阴极弧法合成三元氮化膜

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Changes in microstructures and corresponding physical properties of ternary nitride films such as Ti_(1-X)Al_XN, Ti_(1-X)Cr_XN, Ti_(1-X)Zr_XN, Cr_(1-X)Al_XN and Zr_(1-X)Al_XN were briefly summarized focused on micro-hardness with respect to different x value. The crystal structure and lattice parameter of ternary films change with x value and their physical properties correspondingly change as well. In this paper, the maximum hardness of ternary nitride films with particular x value was discussed based on the phase transition, analyzed by the X-ray diffraction method and transmission electron microscopy.
机译:Ti_(1-X)Al_XN,Ti_(1-X)Cr_XN,Ti_(1-X)Zr_XN,Cr_(1-X)Al_XN和Zr_(1-X)等三元氮化物膜的微观结构和相应物理性能的变化简要总结了Al_XN,重点是针对不同x值的显微硬度。三元膜的晶体结构和晶格参数随x值变化,其物理性质也相应变化。本文基于相变讨论了具有特定x值的三元氮化物膜的最大硬度,并通过X射线衍射法和透射电子显微镜进行了分析。

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