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Influence of Substrate Temperature on Properties of Tin Sulfide Thin Films

机译:基板温度对硫化锡薄膜性能的影响

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Tin sulfide (SnS) thin films for solar cells were deposited by vacuum evaporation at different substrate temperatures in a range of 20~200℃. The films were characterized with X-ray diffraction (XRD) and scanning electron microscopy (SEM) for structural analysis. The electrical and optical properties were also investigated. Under the substrate temperature of 150℃, the obtained SnS thin film was in orthorhombic structure with a grain size of 0.5 μm and composition of Sn:S =1:1. The measurement results from hot probe method showed p-type nature for the deposited films. Dark-conductivity and photo-conductivity were 0.01Ω~(-1)cm~(-1) and 0.08Ω~(-1)cm~(-1), respectively. The optical band-gap energy of the films was estimated to be 1.402 eV.
机译:在20〜200℃范围内的不同衬底温度下,通过真空蒸发沉积了用于太阳能电池的硫化锡(SnS)薄膜。用X射线衍射(XRD)和扫描电子显微镜(SEM)对薄膜进行表征,以进行结构分析。还研究了电学和光学性质。在150℃的基板温度下,所得的SnS薄膜呈正交晶结构,晶粒尺寸为0.5μm,Sn:S = 1:1。热探针法的测量结果显示出沉积膜的p型性质。暗电导率和光电导率分别为0.01Ω〜(-1)cm〜(-1)和0.08Ω〜(-1)cm〜(-1)。薄膜的光学带隙能量估计为1.402 eV。

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