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Influence of Substrate Temperature on Properties of Tin Sulfide Thin Films

机译:基材温度对硫化锡薄膜性能的影响

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Tin sulfide (SnS) thin films for solar cells were deposited by vacuum evaporation at different substrate temperatures in a range of 20~200°C. The films were characterized with X-ray diffraction (XRD) and scanning electron microscopy (SEM) for structural analysis. The electrical and optical properties were also investigated. Under the substrate temperature of 150°C, the obtained SnS thin film was in orthorhombic structure with a grain size of 0.5 μm and composition of Sn:S =1:1. The measurement results from hot probe method showed p-type nature for the deposited films. Dark-conductivity and photo-conductivity were 0.01Ω~(-1)cm~(-1) and 0.08Ω~(-1)cm~(-1), respectively. The optical band-gap energy of the films was estimated to be 1.402 eV.
机译:通过在20〜200℃的不同基板温度下真空蒸发沉积用于太阳能电池的硫化锡(SNS)薄膜。该薄膜的特征在于X射线衍射(XRD)和扫描电子显微镜(SEM),用于结构分析。还研究了电气和光学性质。在150℃的基板温度下,所得的SnS薄膜在正交结构中,晶粒尺寸为0.5μm,Sn的组成:s = 1:1。热探针方法的测量结果显示了沉积膜的p型性质。暗导率和光电导率分别为0.01Ω〜(-1)cm〜(-1)和0.08Ω〜(-1)cm〜(-1)。薄膜的光带间隙能量估计为1.402eV。

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