Simulation Study on Precision Vibration reduction System for Working Stage of Lithography

摘要

The paper aims at ensuring accurately its static state and dynamic state to a relative stabilization level and reducing the vibrating amplitude of the simulated working table during the exposure processing of a lithography. According to the step motion and synchronous scanning motion of the lithography and some features of the earth vibration, the paper designs the precision vibration reduction of the simulated working stage of the Lithography and chooses STACIS-2000 vibration reduction equipments as the active vibration reduction equipments. Meanwhile the paper establishes the virtual simulation model of lithography by virtue of the ADAMS software. Using passive and active control method, analysis the typical impulse working responses of the simulated work stage. The results indicate that only using passive vibration reduction method cannot meet the working requirements of the lithography and the active vibration reduction method must be used and the design in this paper can meet the requirements.