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Influence of substrate orientation on InAs/GaAsquantum-dot growth studied by photoluminescence inpulsed magnetic fields

机译:衬底取向对InAs / GaAs量子点生长的影响

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By using photoluminescence spectroscopy in very high magnetic fields (<50 tesla) we have investigated the dependence of InAs quantum dot formation on the GaAs substrate orientation. For InAs deposited on (100)-oriented GaAs, an abrupt change from one-dimensional to three-dimensional charge confinement is observed. On substrates cleaved along the (311)B axis, there is a much weaker charge confinement that gradually increases with the amount of InAs deposited. At the highest coverage studied (1.9 monolayers), the quantum-dot confinement is equally effective for both substrate orientations.
机译:通过在非常高的磁场(<50特斯拉)中使用光致发光光谱,我们研究了InAs量子点形成对GaAs衬底取向的依赖性。对于在(100)取向的GaAs上沉积的InAs,观察到从一维电荷约束到三维电荷约束的突然变化。在沿(311)B轴劈开的基板上,电荷限制要弱得多,电荷限制随着InAs沉积量的增加而逐渐增加。在研究的最高覆盖率(1.9个单层)下,量子点限制对于两种衬底方向都同样有效。

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  • 会议地点 Edinburgh(GB);Edinburgh(GB)
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    Laboratorium voor Vaste-Stoffysica en Magnetisme Katholieke Universiteit Leuven Celestijnenlaan 200D B-3001 Leuven Belgium http://www.fys.kuleuven.ac.be/vsm/pf;

    School of Physics and Astronomy University of Nottingham Nottingham NG7 2RD UK http://www.nottingham.ac.uk/physics/research/semiconductors;

    School of Physics and Astronomy University of Nottingham Nottingham NG7 2RD UK http://www.nottingham.ac.uk/physics/research/semiconductors;

    School of Physics and As;

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