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Plasma processing of materials: The diagnostic study of pulsed magnetron systems for thin film deposition

机译：材料的等离子处理：用于薄膜沉积的脉冲磁控管系统的诊断研究

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《International Conference on Phenomena in Ionized Gases;ICPIG 2005》|2005年|p.1-4|共4页
会议地点 Eindhoven(NL);Eindhoven(NL)
作者
J.W. Bradley;
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Department of Electrical Engineering and Electronics University of Liverpool Brownlow Hill Liverpool L69 3GJ U.K;

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1. Plasma diagnostics in the pulse magnetron sputtering system used for deposition Ti-C : H thin films [J] . Cada M, Hubicka Z, Kulikovsky V, Surface & Coatings Technology . 2006,第12a13期

机译：用于沉积Ti-C：H薄膜的脉冲磁控溅射系统中的等离子体诊断
2. Hybrid high power impulse and radio frequency magnetron sputtering system for TiCrSiN thin film depositions: Plasma characteristics and film properties [J] . Lou Bih-Show, Yang Yung-Chin, Qiu Yi-Xiang, Surface & Coatings Technology . 2018,第期

机译：用于TiCrsin薄膜沉积的混合高功率脉冲和射频磁控溅射系统：等离子体特性和薄膜性能
3. The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering [J] . Field MR, McCulloch DG, Lim SNH, Journal of Physics. Condensed Matter . 2008,第17期

机译：脉冲阴极电弧沉积和等离子体辅助脉冲磁控溅射制备氧化钨薄膜的电子结构
4. Plasma flare of pulsed-microwave surface discharge in vacuum for thin film deposition and materials processing [C] . Alexander A. Ravaev, Moscow Radiotechnical Institute, Moscow, International symposium on discharges and electrical insulation in vacuum . 1994

机译：真空中脉冲微波表面放电的等离子体耀斑，用于薄膜沉积和材料处理
5. Ultra-thin boron nitride films by pulsed laser deposition: Plasma diagnostics, synthesis, and device transport [D] . Glavin, Nicholas Robert 2016

机译：通过脉冲激光沉积的超薄氮化硼膜：等离子体诊断，合成和器件传输
6. Combined magnetron sputtering and pulsed laser deposition of TiO2 and BFCO thin films [O] . D. Benetti, R. Nouar, R. Nechache, -1

机译：磁控溅射与TiO2和BFCO薄膜的脉冲激光沉积相结合
7. Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering [O] . Sønderby, Steffen, Aijaz, Asim, Helmersson, Ulf, 2014

机译：大功率脉冲磁控溅射和脉冲磁控溅射沉积钇稳定的氧化锆薄膜

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