Thermal design methodology of hot and chill plates for photolithography

摘要

Abstract: The major requirement for hot- and chill-plate designs is that they provide repeatable and uniform process conditions thereby assuring consistent photoresist quality. A collection of feature-based thermal models has been developed to predict temperature-time histories considering plate construction features including chuck heating/cooling methods, sensor placement with a PID control algorithm, and effects due to vacuum grooves, access holes, support pins and edge-gap. These models can be used by designers and process technologists to assess new approaches, optimize current design and set performance specifications. !6