PHOTOLITHOGRAPHY APPARATUS, SCANNING PHOTOLITHOGRAPHY APPARATUS, DEVICE MANUFACTURING METHOD, ORIGINAL PLATE CLEANING METHOD, AND THE ORIGINAL PLATE

摘要

PROBLEM TO BE SOLVED: To provide cleaning technology for an original plate advantageous in terms of a throughput and cleaning performance.;SOLUTION: A scanning photolithography apparatus has an original plate stage for holding the original plate and moving in the scanning direction, an illumination optical system for illuminating the original plate held on the original plate stage by light from an exposure light source, a substrate stage for holding a substrate and moving in the scanning direction, and a projection optical system for projecting a pattern on the original plate onto the substrate. The scanning photolithography apparatus has an irradiating means for irradiating the light for cleaning to the original plate held on the original plate stage.;COPYRIGHT: (C)2006,JPO&NCIPI