Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

摘要

Simulations of a novel two exposure process to extend a form of photolithography known as double exposure (DE) have revealed the need for nonlinear responsive materials. We describe the design and experimental realization of sequential two photon photoacid generation for the nonlinear production of acid for photolithography at 193 nm and shorter wavelengths.