Photoacid generator and resin composition for photolithography

摘要

An object of the present invention is to provide a nonionic photoacid generator having high photosensitivity to i-line, excellent compatibility and solubility in a resist solution, and excellent thermal stability. This invention is represented by following General formula (1), The nonionic photo-acid generator (A) characterized by the above-mentioned. [In formula (1), X is an oxygen atom or a sulfur atom, R1 is a hydrogen atom or an alkyl group having 1 to 12 carbon atoms which may have a carboxylic acid group, R2 is a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, Rf represents a hydrocarbon group having 1 to 12 carbon atoms in which part or all of hydrogen is substituted with fluorine.]