The photolithography rec chill which possesses static electricity discharge conservation structure

摘要

The photolithography rec chill which possesses static electricity discharge conservation feature is offered. Photolithography rec chill can be formed from metal structure such as chrome structure on the transparent backing material of the melting silica and the like. Several among metal structures with respect to rec chill is produced, when using rec chill with the repetitive printing lithography tool, it corresponds to the transistor and the other electronic device with respect to the integrated circuit. These metal device structures are times when it is easy to receive the influence of the damage with the electrostatic charge accumulation while handling the rec chill. In order to prevent the damage, dummy ring structure, is formed near device structure. Dummy ring structure, in case of static electricity discharge, in order the damage, to be limited to the part of the rec chill which is not important, can be constructed sensitively device structure compared to vis-a-vis static electricity discharge.