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Mechanical properties characterization of CuSn intermetallics for advanced flip-chip bonding

机译:用于高级倒装芯片接合的CuSn金属间化合物的机械性能表征

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In this paper, we investigate the mechanical properties of CuSn intermetallics formed in the Cu/Sn system in three different ways. First, we characterize CuSn intermetallic films by nano-indentation. Here the CuSn intermetallics are formed by interdiffusion of Cu/Sn bi-layer films. Second, we do Cu/Sn flip-chip bonding to form CuSn intermetallic joints and then characterize the intermetallics on small bumps also by nano-indentation. Third, unlike the afore-mentioned two approaches, we fabricate a free-standing CuSn intermetallic beam for micro-tensile test, from which we can extract the Young's modulus, yield strength, and fracture strength. Combining all these experiments, we find the Young's modulus of CuSn intermetallic is between 75 to 150 GPa, the yield strength is ~810 MPa, and the fracture strength is ~980 MPa.
机译:在本文中,我们以三种不同的方式研究了在Cu / Sn系统中形成的CuSn金属间化合物的力学性能。首先,我们通过纳米压痕表征CuSn金属间化合物膜。在这里,CuSn金属间化合物是通过Cu / Sn双层膜的相互扩散而形成的。其次,我们进行Cu / Sn倒装芯片键合以形成CuSn金属间连接,然后通过纳米压痕来表征小凸点上的金属间化合物。第三,与上述两种方法不同,我们制造了用于微拉伸试验的独立式CuSn金属间化合物梁,从中我们可以提取杨氏模量,屈服强度和断裂强度。结合所有这些实验,我们发现金属间化合物CuSn的杨氏模量在75至150 GPa之间,屈服强度约为810 MPa,断裂强度约为980 MPa。

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