首页> 外文会议>Heterostructure epitaxy and devices(HEAD'97) >OPTICAL GAIN IMPROVEMENT OF GaAs LATERAL PHOTORESISTIVE ELEMENTS BY SULPHUR PASSIVATION OF THE SURFACE
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OPTICAL GAIN IMPROVEMENT OF GaAs LATERAL PHOTORESISTIVE ELEMENTS BY SULPHUR PASSIVATION OF THE SURFACE

机译:表面硫的钝化对GaAs横向光致电阻元件的光学增益改善

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摘要

Enhancement of the performance of photoresistive elements has been demonstrated by applying sulphur surface passivation using Na_2S· 9H_2O water solution, mainly due to the decrease of the surface recombination current, resulting in an increase of the light sensitivity and switching rate. These results confirm the passivation of surface states through surface sulphur treatments. Further investigations using layer thicknesses comparable with the light absorption depth, are necessary and also smaller gaps between the contacts, and the changes in the speed of such devices are to be studied.
机译:通过使用Na_2S·9H_2O水溶液进行硫表面钝化已显示出光致抗蚀剂性能的增强,这主要是由于表面复合电流的降低,从而导致了光敏性和开关速率的提高。这些结果证实了通过表面硫处理的表面态的钝化。使用与光吸收深度相当的层厚度的进一步研究是必要的,并且触点之间的间隙也较小,并且将研究这种装置的速度变化。

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