Stimulated Creation of the SOI Structures with Si nano-clusters by low-dose SIMOX Technology

摘要

The peculiarities of a buried layer formation obtained by a co-implantation of O_2 ions with the energy of 130 keV and carbon ions within the energy range of 30-50 keV have been investigated. The corresponding ion doses for carbon and oxygen ions were equal to 2.10~(16) cm~(-2) and 1.810~(17) cm~(-2), respectively. It has been observed that annealing at 1150℃ results in enhanced oxygen diffusion towards the region with a maximum carbon concentration. Analysis of x-ray diffraction patterns and TEM images confirm formation of Si nanoclusters in the SiO_2 buried layer. The intensive luminescence with the maximum at 600 nm has been observed in the synthesized structures.