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Angle-Resolved PES Studies on Transition Layers at SiO_2/SiC Interfaces

机译:SiO_2 / SiC界面过渡层的角度分辨PES研究

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摘要

We investigated on the chemical bonding states of thermally oxidized SiO_2/SiC in detail by the angle-resolved X-ray photoemission spectroscopy. Analyses of Si 2p, C 1s and O1s spectra show that the signal arising from sub-oxide is detected, and that the signals related carbon in SiO_2 and C-C in SiC are detected. We also characterized SiO_2/4H-SiC by Hard X-ray photoemission spectroscopy in order to check the depth profile of carbon in oxide in detail.
机译:我们通过角分辨X射线光发射光谱详细研究了热氧化的SiO_2 / SiC的化学键合状态。对Si 2p,C 1s和O1s光谱的分析表明,可以检测到由次氧化物引起的信号,并且可以检测到与SiO_2中的碳有关的信号以及与SiC中的C-C有关的信号。我们还通过硬X射线光发射光谱法对SiO_2 / 4H-SiC进行了表征,以便详细检查氧化物中碳的深度分布。

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  • 会议地点 Honolulu HI(US)
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    Electrical and Electron Engineering, Tokyo city University, 1-28-1 Tamazutumi, Setagaya-ku, Tokyo 158-8557, Japan;

    Electrical and Electron Engineering, Tokyo city University, 1-28-1 Tamazutumi, Setagaya-ku, Tokyo 158-8557, Japan;

    Electrical and Electron Engineering, Tokyo city University, 1-28-1 Tamazutumi, Setagaya-ku, Tokyo 158-8557, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1 Kouto, Sayo-cho, Sayo District, Hyogo 679-5198, Japan;

    Japan Synchrotron Radiation Research Institute, 1-1 Kouto, Sayo-cho, Sayo District, Hyogo 679-5198, Japan;

    Electrical and Electron Engineering, Tokyo city University, 1-28-1 Tamazutumi, Setagaya-ku, Tokyo 158-8557, Japan;

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