首页> 外文会议>Symposium on Gallium Nitride(GaN) and Silicon Carbide(SiC) Power Technologies >Angle-Resolved PES Studies on Transition Layers at SiO_2/SiC Interfaces
【24h】

Angle-Resolved PES Studies on Transition Layers at SiO_2/SiC Interfaces

机译:SIO_2 / SIC接口过渡层的角度解析PES研究

获取原文

摘要

We investigated on the chemical bonding states of thermally oxidized SiO_2/SiC in detail by the angle-resolved X-ray photoemission spectroscopy. Analyses of Si 2p, C 1s and O1s spectra show that the signal arising from sub-oxide is detected, and that the signals related carbon in SiO_2 and C-C in SiC are detected. We also characterized SiO_2/4H-SiC by Hard X-ray photoemission spectroscopy in order to check the depth profile of carbon in oxide in detail.
机译:通过角度分辨的X射线照相光谱分析,我们研究了热氧化SiO_2 / SiC的化学键合状态。 Si 2P,C 1S和O1S光谱的分析表明,检测来自亚氧化物产生的信号,检测SiO_2和SiC中的信号相关碳。我们还通过硬X射线照射光谱表征SiO_2 / 4H-SiC,以便详细检查氧化物中碳的深度轮廓。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号