首页> 外文会议>Fifteenth International Symposium on Chemical Vapor Deposition, May 14-18, 2000, Toronto, Ontario >DIAGNOSTICS OF METALOROANIC CHEMICAL VAPOR DEPOSITION OF (Ba,Sr)TiO_3 FILMS BY MICRODIS- CHARGE OPTICAL EMISSION SPECTROSCOPY
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DIAGNOSTICS OF METALOROANIC CHEMICAL VAPOR DEPOSITION OF (Ba,Sr)TiO_3 FILMS BY MICRODIS- CHARGE OPTICAL EMISSION SPECTROSCOPY

机译:微放电光发射光谱法诊断(Ba,Sr)TiO_3薄膜的金属有机化学气相沉积

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摘要

Thermal decomposition and oxidation of source molecules for MOCVD of (Ba,Sr)TiO_3 films as well as the interaction with other source molecules were investigated by using microdischarge optical emission spectroscopy ( μD-OES), which was developed as a new technique for diagnosis of MOCVD processes. The gas phase reactions observed by μD-OES was discussed referring to the incorporation rate of deposited SrTiO_3 films. Fourier transform infrared (FT-IR) spectroscopy was also employed in order to understand the gas phase reactions in more detail.
机译:利用微放电光发射光谱法(μD-OES)研究了用于(Ba,Sr)TiO_3薄膜的MOCVD的源分子的热分解和氧化以及与其他源分子的相互作用,该技术被开发为一种诊断碳纳米管的新技术。 MOCVD工艺。参照沉积的SrTiO_3膜的掺入率讨论了通过μD-OES观察到的气相反应。为了更详细地了解气相反应,还使用了傅里叶变换红外(FT-IR)光谱。

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