首页> 外文会议>Fifteenth International Symposium on Chemical Vapor Deposition, May 14-18, 2000, Toronto, Ontario >Stability of RuO_2 Bottom Electrode and its Effect on the Ba-Sr-Ti Oxide Film Quality
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Stability of RuO_2 Bottom Electrode and its Effect on the Ba-Sr-Ti Oxide Film Quality

机译:RuO_2底电极的稳定性及其对Ba-Sr-Ti氧化物膜质量的影响

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We have performed the thermodynamic calculations to evaluate the thermal stability of RuO_2 film and its effect on the BST film quality in MOCVD process. The degradation of RuO_2 occurs in two different reaction pathways depending on process conditions. One is the simple decomposition of RuO_2 producing metallic Ru and gaseous oxygen, which mainly happens when no excess O_2 is present in the feed at low pressures. The other is the etching of RuO_2 film by excess O_2 in the gaseous stream, which produces RuO_3 and RuO_4 species. The calculation results on Ba-Sr-Ti-Ru-C-H-O system also present the optimal feed composition and process conditions that result the high-quality (Ba,Sr)TiO_3 film.
机译:我们已经进行了热力学计算,以评估RuO_2薄膜的热稳定性及其对MOCVD工艺中BST薄膜质量的影响。根据工艺条件,RuO_2的降解发生在两个不同的反应路径中。一种是RuO_2的简单分解,生成金属Ru和气态氧,主要发生在低压下进料中不存在过量O_2的情况下。另一个是通过气流中过量的O_2腐蚀RuO_2膜,产生RuO_3和RuO_4物质。 Ba-Sr-Ti-Ru-C-H-O系统的计算结果也提供了最佳的进料组成和工艺条件,从而得到了高质量的(Ba,Sr)TiO_3膜。

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