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首页> 外文期刊>Journal of Materials Research >The effect of RuO_2/Pt hybrid bottom electrode structure on the leakage and fatigue properties of chemical solution derived Pb(Zr_xTi_1-x)O_3 thin films
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The effect of RuO_2/Pt hybrid bottom electrode structure on the leakage and fatigue properties of chemical solution derived Pb(Zr_xTi_1-x)O_3 thin films

机译:RuO_2 / Pt杂化底部电极结构对化学溶液衍生的Pb(Zr_xTi_1-x)O_3薄膜的泄漏和疲劳性能的影响

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摘要

We have investigated the effect of RuO_2 (l0, 30, 50 nm)/Pt layered hybrid bottom electrode structure and film composition on the leakage and fatigue properties of chemical solution derived Pb(Zr_xTi_l-x)O_3 (PZT) thin films. It was observed that the use of high Ti content (Zr: Ti = 30: 70) films with control of excess PbO at the thin RuO_2 (l0 nm)/Pt bottom electrode surface reduced leakage current and showed good fatigue properties with high remanent polarization compared to the use of high Zr films (Zr :Ti = 50 : 50) or thicker RuO_2 (30, 50 nm)/Pt bottom electrodes. Typical P-E hysteresis behavior of PZT films was observed even at an applied voltage of 3 V, demonstrating greatly improved remanence and coercivity. Fatigue and breakdown characteristics of these modified PZT thin films (Zr: Ti = 30 : 70) on RuO_2 (l0 nm)/Pt, measured at 5 V, showed stable behavior, and less than l5 fatigue degradation was observed up to l0~l0 cycles.
机译:我们研究了RuO_2(10,30,50 nm)/ Pt层状混合底部电极结构和膜组成对化学溶液衍生的Pb(Zr_xTi_1-x)O_3(PZT)薄膜的泄漏和疲劳性能的影响。观察到,在薄RuO_2(10 nm)/ Pt底部电极表面使用高Ti含量(Zr:Ti = 30:70)薄膜并控制过量PbO的情况可减少漏电流,并表现出良好的疲劳特性和高剩余极化强度与使用高Zr膜(Zr:Ti = 50:50)或更厚的RuO_2(30,50 nm)/ Pt底部电极相比。即使在施加3 V的电压时,也观察到了PZT膜的典型P-E磁滞行为,表明其剩磁和矫顽力大大提高。这些改性的PZT薄膜(Zr:Ti = 30:70)在RuO_2(10 nm)/ Pt上的疲劳和击穿特性在5 V下测量,表现出稳定的行为,直到l0〜l0观察到不到15的疲劳降解周期。

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