Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Vermont Technical College, 124 Admin Drive, Randolph Center, VT 05061, USA;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
Imec, Kapeldreef 75, 3001 Leuven, Belgium;
ASML, De Run 6501, 5504DR Veldhoven, The Netherlands;
ASML, De Run 6501, 5504DR Veldhoven, The Netherlands;
ASML, De Run 6501, 5504DR Veldhoven, The Netherlands;
ASML, De Run 6501, 5504DR Veldhoven, The Netherlands;
ASML, De Run 6501, 5504DR Veldhoven, The Netherlands;
Metal layer patterning; EUV; BEOL; pattern fidelity; CD-SEM; interconnect reliability;
机译:Imec推动EUV光刻单次曝光的极限,以支持未来的逻辑和存储
机译:BEOL铜金属层中的表面铜空隙
机译:在扫描曝光模式下使用EUV干涉光刻技术制作高分辨率大面积图案
机译:IMEC IN7平台上的BEOL金属层的单次曝光EUV图案
机译:纳米工程表面上软骨细胞的生长和行为以及使用逐层组装剥离法的逐层平台构建微模式共培养平台。
机译:在单次损伤阈值以下的长期自由电子激光照射下EUV镜辐射损伤抵抗性的实验研究
机译:时序临界感知设计优化在连续金属层上使用BEOL气隙技术