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A New Reliable Adhesion Enhancement Process for Directly Plating on Molding Compounds for Package Level EMI Shielding

机译:直接在模塑料上电镀以实现封装级EMI屏蔽的可靠的增粘新工艺

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Plating on molding compound is a relatively new field whichcould open up new package designs. One major application is conformal self EMI shielding (package level shielding) of ICs. Generally, EMI shielding is done mainly by metallic cans, however, this technique increases the space requirements and reduces flexibility of component layout on the PCB, that would not be suitable to handset products. An alternative and more space saving approach is 'Conformal Self EMI Shielding (package level shielding)'. A popular method to provide a metallic seed layer for'Conformal Self EMI Shielding' is sputtering and conductive paste, however, in order to make it more cost effective and feasible for mass production, there is a need for classical electroless plating metallization along with adhesion enhancement process. While in some instances conductive paste and sputtering metallization will provide adequate adhesion -- it has the technical drawbacks of poorsidewall coverage and limited metal layer thickness that would not fulfill for lower frequency noise shield. As a result, scale-up for mass production is relatively difficult and costly. Classical electroless and electrolytic plating metallization are much more desirable but have been so far limited by insufficient adhesion by existing chemical treatment, due to the presence of extremely high ratio (80-90%wt.) and irregular size (from few μm to tens of μm) offillers. In this paper we will present a new 'Adhesion nhancementProcess' approach that is based on an innovative combination of mechanical anchoring by selective resin etching and chemical adhesion promoter along with adhesion results and shielding effectiveness results. This adhesion enhancement technology is applicable to various kinds of molding compounds. Extending this technology to new package design (Embedded PoP/SiP) can be other reaching applications.
机译:在模塑料上电镀是一个相对较新的领域,可以开辟新的包装设计。一种主要应用是IC的保形自EMI屏蔽(封装级屏蔽)。通常,EMI屏蔽主要由金属罐完成,但是,此技术增加了空间要求,并降低了PCB上组件布局的灵活性,这不适用于手机产品。另一种节省空间的方法是“共形自我EMI屏蔽(封装级屏蔽)”。为“共形自EMI屏蔽”提供金属籽晶层的一种流行方法是溅射和导电胶,但是,为了使其更具成本效益和批量生产的可行性,需要经典的化学镀金属以及附着力增强过程。尽管在某些情况下,导电胶和溅射金属镀层将提供足够的附着力-但它的技术缺点是侧壁覆盖率差且金属层厚度有限,这对于低频噪声屏蔽来说是无法满足的。结果,大规模生产的规模扩大是相对困难且昂贵的。经典的化学镀和电解镀金属镀层更为理想,但由于存在极高的比例(80-90%wt。)和不规则的尺寸(从几微米到几十微米不等),迄今为止,由于现有化学处理的附着力不足而受到限制μm)的填料。在本文中,我们将介绍一种新的“附着力增强工艺”方法,该方法基于通过选择性树脂蚀刻和化学附着力促进剂的机械锚固以及附着力结果和屏蔽效果结果的创新组合。这种粘合力增强技术适用于各种模塑料。将这项技术扩展到新的封装设计(嵌入式PoP / SiP)可能是其他应用。

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