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Point defect characterization of Zn- and Cd-based semiconductors using positiron annihilation techniques

机译:使用正铁an没技术表征Zn和Cd基半导体的点缺陷

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A study of point defects in II-VI compound semiconductors was undertaken and has revealed that open volume defects are present in a wide variety of these samples. Zn-based binary compounds contain primarily neutral divacancy defects in concentrations in the mid 10~(16) cm~(-3). CdTe samples contain neutral monovacancy sized defect complexes in the high 10~(16) cm~(-3) range. When a small fraction of Zn or Se is alloyed into CdTe the defect profile changes dramatically to one dominated by divacancy sized defects at roughly half the original concentration.
机译:对II-VI化合物半导体中的点缺陷进行了研究,结果表明,在许多此类样品中均存在开口体积缺陷。锌基二元化合物主要在10〜(16)cm〜(-3)中浓度处含有中性空位缺陷。 CdTe样品在10〜(16)cm〜(-3)范围内含有中性的单空位缺陷复合物。当一小部分的Zn或Se合金化成CdTe时,缺陷轮廓会急剧变化,变成大约占原始浓度一半的空位尺寸缺陷占主导的位置。

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