首页> 外文会议>Computational Electronics (IWCE), 2012 15th International Workshop on >Self-heating and current degradation in 25 nm FD SOI devices with (100) and (110) crystallographic orientation
【24h】

Self-heating and current degradation in 25 nm FD SOI devices with (100) and (110) crystallographic orientation

机译:具有(100)和(110)晶体取向的25 nm FD SOI器件中的自热和电流衰减

获取原文
获取原文并翻译 | 示例

摘要

In this paper we present simulation results obtained with our electro-thermal particle-based device simulator for 25 nm fully depleted silicon-on-insulator devices with (100) and (110) crystallographic orientations. We also investigate the importance of the proper choice of the thermal conductivity model (which is particularly important for thin silicon films) in properly predicting the average maximum temperature and the maximum temperature in the hot spot which are important parameters regarding device reliability.
机译:在本文中,我们介绍了基于电热粒子的器件模拟器对25nm完全耗尽的绝缘体上硅器件具有(100)和(110)晶体取向的仿真结果。我们还研究了正确选择导热系数模型(这对于薄膜硅来说尤为重要)在正确预测平均最高温度和热点最高温度(对于器件可靠性而言是重要参数)方面的重要性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号