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Vacancy-type defects in GaN-based power device structure - defect characterization in ion implanted GaN and Al

机译:GaN基功率器件结构中的空位型缺陷-离子注入GaN和Al中的缺陷表征

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/GaN structure were probed using monoenergetic positron beams. In Mg-implanted GaN, the major defect species was a complex of a Ga-vacancy and a nitrogen vacancy. After annealing above 1000°C, the major defect species was changed to vacancy clusters due to the agglomeration of vacancies. The carrier trapping/detrapping properties of the vacancy-type defects and their time dependences were also revealed. Al
机译:使用单能正电子束探测/ GaN结构。在注入了Mg的GaN中,主要的缺陷种类是Ga空位和氮空位的复合体。在高于1000°C的温度下退火后,由于空位的聚集,主要缺陷种变成了空位簇。还揭示了空位型缺陷的载流子俘获/俘获性质及其时间依赖性。铝

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  • 来源
    《Compound Semiconductor Week》|2019年|1-1|共1页
  • 会议地点 Nara(JP)
  • 作者单位

    Division of Applied Physics Faculty of Pure and Applied Science University of Tsukuba Japan;

    Universität der Bundeswehr München Institut für Angewandte Physik und Messtechnik Germany;

    Technische Universität München Germany;

    CD-FMat AIST Japan;

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