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Modeling of Schottky barrier diode characteristics on heteroepitaxial β-gallium oxide thin films

机译:外延β-氧化镓薄膜上肖特基势垒二极管特性的建模

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When investigating Schottky contacts on heteroepitaxial β-Ga_2O_3 thin films, several non-idealities are observed in the current voltage characteristics, which cannot be accounted for with the standard diode current models. In this article, we therefore employed a model for the rigorous calculation of the diode currents in order to understand the origin of this non-idealities. Using the model and a few parameters determined from the measurements, we were able to simulate the characteristics with good agreement to the measured data for temperatures between 30 ℃ and 150 ℃. Fitting of the simulated curves to the measured curves allows a deeper insight into the microscopic origins of said non-idealities.
机译:在研究异质外延β-Ga_2O_3薄膜上的肖特基接触时,在电流电压特性中观察到了几种非理想情况,这在标准二极管电流模型中无法解决。因此,在本文中,我们采用了一个模型来严格计算二极管电流,以了解这种不理想的起源。使用该模型和由测量确定的一些参数,我们能够模拟特性,与温度在30℃至150℃之间的测量数据吻合良好。模拟曲线与测量曲线的拟合允许更深入地了解所述非理想的微观起源。

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