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Influence of the Work Function of the Substrate in the Energy-Level Alignment atOrganic-Organic Heterojunction Interface

机译:基板功函数在有机-有机异质结界面能级排列中的影响

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In the past years, many works have been dedicated to understand the origin of the band bending in organic thin films and the energy-level alignment (ELA) at organic-inorganic and organic-organic heterojunction (OOH) interfaces. In this work, we are interested in understanding the influence of the substrate work function (WF) at donor/acceptor interface and the role of the tail states in the ELA. To do so, we used X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) to study the ELA of boron subphthalocyanine chloride (SubPc)/ a-sexithiophene (6T) deposited on MoO3 and Cs2C〇3. Their work function values are 5.9, 4.0, 3.0 eV, respectively. The ionization potential (IP) of SubPc and 6T were measured as 5.7 and 4.7 eV, respectively. First, we deposited 6T (5.0 nm) on these substrates and we observed that the high WF substrate induced a charge transfer from 6T in order to reach the thermodynamic equilibrium. On the other hand, Cs2C〇3 induced a charge transfer on the opposite direction. Figure1shows the peak shift of the S 2p. After the first deposition of SubPc (0.4nm), a shift of the S 2p peak was observed in the films deposited on both substrates, which can be explained as a charge transfer due to the formation of the donor-acceptor heterojunction interface. After the following depositions, we observed that for the films deposited on MoO3, the S 2p peak shifted for a high binding energy (BE) and for a low BE on the case of the Cs2CO3 substrate. The band bending in SubPc can be extracted by the Cl2p - S 2p peak shift, displayed in Fig. 2, and we observed a shift for alow BE in the films deposited on both substrates, which can be explained as a charge transfer from 6T to the unoccupied tail states in SubPc. After annealing we observed a drastic reduction of the core-level shift at the organic films, which could be explained as reduction of the density of the SubPc tail states that controls the band bending at the OOH interface by better molecular stacking due to annealing, which reduces the available states to charge transfer to achieve the equilibrium.
机译:在过去的几年中,许多工作致力于了解有机薄膜中能带弯曲的起源以及有机-无机和有机-有机异质结(OOH)界面的能级排列(ELA)。在这项工作中,我们有兴趣了解供体/受体界面上底物功函数(WF)的影响以及ELA中尾态的作用。为此,我们使用X射线和紫外光电子能谱(XPS和UPS)研究了沉积在MoO3和Cs2C〇3上的亚酞菁硼硼(SubPc)/α-亚硒基噻吩(6T)的ELA。它们的功函数值分别为5.9、4.0、3.0 eV。 SubPc和6T的电离电势(IP)分别测量为5.7和4.7 eV。首先,我们在这些衬底上沉积了6T(5.0 nm),我们观察到高WF衬底诱导了6T的电荷转移,从而达到了热力学平衡。另一方面,Cs2C〇3引起相反方向的电荷转移。图1显示了S 2p的峰移。在第一次沉积SubPc(0.4nm)之后,在两个基板上沉积的薄膜中都观察到了S 2p峰的移动,这可以解释为由于施主-受主异质结界面的形成而引起的电荷转移。在随后的沉积之后,我们观察到,对于沉积在MoO3上的薄膜,在Cs2CO3基板上,S 2p峰移动以获得高结合能(BE)和低BE。 SubPc中的能带弯曲可以通过图2所示的Cl2p-S 2p峰位移来提取,我们观察到沉积在两个衬底上的薄膜中低BE的位移,这可以解释为电荷从6T转移到SubPc中空闲的尾部状态。退火后,我们观察到有机薄膜的核心能级位移急剧降低,这可以解释为SubPc尾态密度的降低,这是由于退火引起的更好的分子堆叠,从而控制了OOH界面处的能带弯曲。减少电荷转移的可用状态以达到平衡。

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