Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, A.- Einstein-Str. 15, 07743 Jena, Germany,Fraunhofer Institute of Applied Optics and Precision Engineering, A.-Einstein-Str. 7,07745 Jena, Germany;
Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, A.- Einstein-Str. 15, 07743 Jena, Germany;
Fraunhofer Institute of Applied Optics and Precision Engineering, A.-Einstein-Str. 7,07745 Jena, Germany;
Fraunhofer Institute of Applied Optics and Precision Engineering, A.-Einstein-Str. 7,07745 Jena, Germany;
Fraunhofer Institute of Applied Optics and Precision Engineering, A.-Einstein-Str. 7,07745 Jena, Germany;
microstructure fabrication; lithography; diffraction; micro-optics;
机译:直接金属接触印刷光刻技术,用于在蓝宝石衬底上构图亚微米表面结构
机译:通过电光刻技术对蛋白质进行亚微米图案化
机译:使用波导衍射光栅的瞬态电磁波在纳米级光刻中产生干涉图样
机译:i线掩模对准仪光刻技术产生的亚微米周期衍射光栅
机译:利用基于图像的格式,以优化模式数据格式和掩模和掩模模式生成光刻的处理
机译:通过灰度直接图像光刻技术生成可定制的微波浪图案
机译:使用软光刻的亚微米图案化
机译:会聚束电子衍射图的计算机生成