首页> 外文会议>21st International Conference on Defects in Semiconductors (ICDS-21) Jul 16-20, 2001 Giessen, Germany >Luminescence properties of Er,O-codoped GaAs/GaInP double heterostructures grown by organometallic vapor phase epitaxy
【24h】

Luminescence properties of Er,O-codoped GaAs/GaInP double heterostructures grown by organometallic vapor phase epitaxy

机译:有机金属气相外延生长的Er,O掺杂的GaAs / GaInP双异质结构的发光性质

获取原文
获取原文并翻译 | 示例

摘要

Er,O-codoped GaAs/GalnP double heterostructures (DHS: Er,O) were grown by organometallic vapor phase epitaxy and the intra-4f shell transitions of Er ions were investigated by photoluminescence (PL) measurements. Er,O-codoping was carried out with trisdipivaloylmethanatoerbium (Er(DPM)_3) as an Er source and an addition of O_2 diluted with Ar to a reactor. Er,O-codoped GaAs (GaAs: Er,O) and GaInP layers were all grown at 550℃. In-depth profiles showed a uniform distribution of Er and O along the growth direction in the GaAs : Er,O active layer. The Er concentration in the GaAs:Er,O active layer was evaluated to be about 5 x 10~(17)cm~(-3). In 4.2K PL measurements, DHS: Er,O sample exhibited Er―2O lines and the intensity was approximately three times stronger than that of GaAs: Er,O sample. This suggests that photoexcited carriers confined in the GaAs: Er,O active layer contribute effectively to excitation of Er.
机译:通过有机金属气相外延生长Er,O掺杂的GaAs / GalnP双异质结构(DHS:Er,O),并通过光致发光(PL)测量研究Er离子的4f内壳层转变。 Er,O-共掺杂是用三癸二甲酰基甲烷(Er(DPM)_3)作为Er源,并将用Ar稀释的O_2添加到反应器中。掺有Er,O的GaAs(GaAs:Er,O)和GaInP层均在550℃下生长。深入的分布图表明,在GaAs:Er,O活性层中,Er和O沿着生长方向均匀分布。 GaAs:Er,O活性层中的Er浓度约为5 x 10〜(17)cm〜(-3)。在4.2K PL测量中,DHS:Er,O样品表现出Er-2O谱线,强度大约是GaAs:Er,O样品的强度的三倍。这表明限制在GaAs:Er,O活性层中的光激发载流子有效地促进了Er的激发。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号