首页> 外文会议>2017 International Conference on Trends in Electronics and Informatics >Dielectric pocket Ge-source Double Gate Junctionless MOSFET with improved OFF-current and subthreshold characteristics
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Dielectric pocket Ge-source Double Gate Junctionless MOSFET with improved OFF-current and subthreshold characteristics

机译:具有改善的关断电流和亚阈值特性的电介质口袋型锗源双栅极无结MOSFET

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摘要

The concept of Dielectric Pocket (DP) in Ge-source Double Gate Junctionless MOSFET (DG JLMOSFET) is proposed to suppress the Short Channel Effects (SCEs) and provide better OFF current characteristics. The use of Dielectric Pocket at the source and drain ends suppress the entrance of lateral electric field and diffusion of carriers from source/drain into channel and improves ION/IOFF current ratio for optimum performance of the device. This results in significant reduction in SCEs and OFF current. The switching speed of Ge-source DG JLMoSFET is investigated for different length and thickness of Dielectric Pocket. It is seeing that the Switching speed improves as the length and thickness of Dielectric Pocket is increased. On comparison with conventional MOSFET (without Dielectric Pocket), it is observed that the proposed structure gives better performance. Thus DP Ge-source DG JLMOSFET is useful in the design of Low Power VLSI circuits.
机译:提出了锗源双栅无结MOSFET(DG JLMOSFET)中的电介质口袋(DP)概念,以抑制短沟道效应(SCE)并提供更好的O FF 电流特性。在源极和漏极端使用介电袋可抑制横向电场的进入以及载流子从源极/漏极扩散到沟道中,并改善I ON / I OFF 电流以获得最佳性能的比率。这导致SCE和O FF 电流的显着降低。针对不同长度和厚度的电介质袋,研究了锗源DG JLMoSFET的开关速度。可以看出,随着介质口袋的长度和厚度的增加,开关速度也随之提高。与常规MOSFET(无电介质腔)相比,可以发现所提出的结构具有更好的性能。因此,DP Ge源DG JLMOSFET在低功耗VLSI电路的设计中很有用。

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