首页> 外文会议>2014 29th International Conference on Microelectronics Proceedings >Parameter extraction methodology for amorphous IGZO thin film transistors
【24h】

Parameter extraction methodology for amorphous IGZO thin film transistors

机译:非晶IGZO薄膜晶体管的参数提取方法

获取原文
获取原文并翻译 | 示例

摘要

Based on a Gaussian distribution for the subgap states of amorphous InGaZnO transistors, a new methodology is developed for the extraction of the electrical parameters of the transistors. The calculated non-linear Y-function is transformed to a linear one, adopting a mobility model that fits the classical methodology of Y-function traditionally used in MOSFETs. The efficiency of the new Y-function is verified in experimental data, for the extraction of the electrical parameters of the transistor as the threshold voltage, the on-voltage, the mobility, and the characteristic decay energies of the exponential distributions used to simulate the Gaussian distribution. All the transfer characteristics are reconstructed using only the transfer characteristic for Vd=0.1V and the extracted electrical parameters of the transistor.
机译:基于非晶态InGaZnO晶体管的亚隙态的高斯分布,开发了一种新的方法来提取晶体管的电参数。计算出的非线性Y函数转换为线性函数,采用的迁移率模型符合MOSFET中传统使用的Y函数的经典方法。新的Y函数的效率在实验数据中得到了验证,用于提取晶体管的电参数,如阈值电压,导通电压,迁移率和指数分布的特征衰减能量,用于模拟晶体管的电特性。高斯分布。仅使用Vd = 0.1V的传输特性和提取的晶体管电参数来重建所有传输特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号