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Bias dependence of total dose effects in the irradiated EEPROM devices

机译:辐照EEPROM器件中总剂量效应的偏差依赖性

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摘要

Total ionizing dose irradiation effect in EEPROM Devices with different bias was studied in this paper. Three biases, concluded with NONE bias, Zero bias and Work bias, were used in EEPROM devices with “1” state and "0" state in this paper. It was indicated that the threshold voltage shift negatively as total dose increased in EEPROM devices with "1" state and the threshold voltage shift positively as total dose increased in EEPROM devices with "0" state, and the Work bias was the worst irradiation bias regardless of "1" state or "0" state.
机译:研究了不同偏压下EEPROM器件的总电离剂量辐照效应。本文以EEPROM器件中的“ 1”状态和“ 0”状态使用了三种偏置,即无偏置,零偏置和功偏置。结果表明,在“ 1”状态的EEPROM器件中,阈值电压随着总剂量的增加而负向偏移,在“ 0”状态的EEPROM器件中,随着总剂量的增加,其阈值电压正向偏移。处于“ 1”状态或“ 0”状态。

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