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Bias dependence of total dose effects in the irradiated EEPROM devices

机译:辐照EEPROM器件中总剂量效应的偏置依赖性

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Total ionizing dose irradiation effect in EEPROM Devices with different bias was studied in this paper. Three biases, concluded with NONE bias, Zero bias and Work bias, were used in EEPROM devices with “1” state and "0" state in this paper. It was indicated that the threshold voltage shift negatively as total dose increased in EEPROM devices with "1" state and the threshold voltage shift positively as total dose increased in EEPROM devices with "0" state, and the Work bias was the worst irradiation bias regardless of "1" state or "0" state.
机译:本文研究了具有不同偏差的EEPROM器件中的总电离剂量辐照效应。 在本文中,在EEPROM器件中使用了三个偏差,无偏差,零偏差和工作偏置,在EEPROM器件中使用“1”状态和“0”状态。 结果表明,随着具有“1”状态的EEPROM器件中的总剂量增加,阈值电压在具有“1”状态的情况下,随着总剂量在具有“0”状态的EEPROM器件中,阈值电压呈正常情况下,无论如何都是最糟糕的照射偏差 “1”状态或“0”状态。

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