首页> 外文会议>18th Symposium on Microelectronics Technology and Devices; 16th Symposium on Integrated Circuits and System Design; Sep 8-11, 2003; Sao Paulo, Brazil >STUDY OF THE INFLUENCE OF THE SECONDARY ELECTRON EMISSION COEFFICIENT IN RADIO-FREQUENCY ARGON PLASMAS USING PARTICLE IN CELL SIMULATION
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STUDY OF THE INFLUENCE OF THE SECONDARY ELECTRON EMISSION COEFFICIENT IN RADIO-FREQUENCY ARGON PLASMAS USING PARTICLE IN CELL SIMULATION

机译:用粒子模拟研究二次电子发射系数对射频氩等离子体的影响

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Capacitive radio frequency argon discharges were simulated for a symmetric system, using a plasma computational code, known as Particle In-Cell plus Monte Carlo Collision (PIC - MCC). The simulations showed that the plasma density increases when the secondary electron emission coefficient increases. The electron energy distribution function is also influenced by the secondary electron emission, especially in the region of the high tail energies. In order to obtain reliable simulation results for secondary electron emission coefficients different from zero, it was necessary to introduce an electron-ion recombination reaction in the simulation.
机译:使用等离子计算代码(称为“粒子内单元加蒙特卡洛碰撞”(PIC-MCC))对对称系统模拟了电容性射频氩气放电。模拟表明,当二次电子发射系数增加时,等离子体密度增加。电子能量分布函数还受到二次电子发射的影响,特别是在高尾能量的区域中。为了获得对于零以外的二次电子发射系数的可靠的模拟结果,有必要在模拟中引入电子-离子重组反应。

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