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/ HETEROJUNCTION DIODE MADE OF GALLIUM OXIDE/4H-SiC AND MANUFACTURING METHOD THEREOF
/ HETEROJUNCTION DIODE MADE OF GALLIUM OXIDE/4H-SiC AND MANUFACTURING METHOD THEREOF
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机译:/异质结二极管由氧化镓/ 4H-SIC制成及其制造方法
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摘要
The present invention relates to a method for manufacturing a gallium oxide/silicon carbide heterojunction diode for ultra violet light sensing using a radio frequency (RF) sputtering method, and to a heterojunction diode thereof. In the method of manufacturing a heterojunction diode according to an embodiment of the present invention, a silicon carbide (SiC) substrate is prepared, a gallium oxide (Ga 2 O 3 ) layer is formed on the silicon carbide substrate, and a heat treatment of the gallium oxide layer is performed, and , an anode is formed on the gallium oxide layer, and a cathode is formed under the silicon carbide substrate.
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机译:本发明涉及使用射频(RF)溅射方法的氧化镓/碳化碳异质结二极管的制造氧化镓/碳化硅异质结二极管,以及其异质结二极管。 在根据本发明的实施例的制造异质结二极管的方法中,制备碳化硅(SiC)基板,在碳化硅基板上形成氧化镓(Ga 2 O 3)层,以及热处理 进行氧化镓层,并且在氧化镓层上形成阳极,并且在碳化硅衬底下形成阴极。
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