首页> 外国专利> MATERIALS FOR FABRICATING THIN FILMS, METHODS OF FABRICATING THIN FILMS USING THE SAME, AND EQUIPMENT FOR FABRICATING THIN FILMS USING THE SAME

MATERIALS FOR FABRICATING THIN FILMS, METHODS OF FABRICATING THIN FILMS USING THE SAME, AND EQUIPMENT FOR FABRICATING THIN FILMS USING THE SAME

机译:制造薄膜的材料,使用相同制造薄膜的方法,以及使用相同制造薄膜的设备

摘要

Materials for fabricating a thin film that has improved quality and productivity are provided. The materials may include a Group 5 element precursor of formula (1):; M1 may be a Group 5 element, each of R1 to R10 independently may be a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms, or f7onnula (2), R11 may be a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and L1 may be an alkyl group, an alkylamino group, an alkoxy group or an alkylsilyl group, each of which may have 1 to 5 carbon atoms and may be substituted or unsubstituted. Formula (2) may have a structure of ; Each of Ra to Rc independently may be a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms.
机译:提供了制造具有改善质量和生产率的薄膜的材料。 材料可包括式(1)的第5组元素前体: M1可以是5元件,R1至R10独立地可以是氢原子,其具有1至5个碳原子的取代或未取代的烷基,或F7onnuma(2),R11可以是具有1的取代或未取代的烷基。 至10个碳原子和L1可以是烷基,烷基氨基,烷氧基或烷基甲硅烷基,每个烷基甲硅烷基可以具有1至5个碳原子,并且可以被取代或未取代。 公式(2)可以具有; RA至RC的每个可以是具有1至5个碳原子的取代或未取代的烷基。

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