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UV Surface vacuum deposition method of reflector for air conditioner sterilization with improved UV-ultraviolet reflectance and vacuum deposition device therefor
UV Surface vacuum deposition method of reflector for air conditioner sterilization with improved UV-ultraviolet reflectance and vacuum deposition device therefor
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机译:空调灭菌反射器UV表面真空沉积方法,其改进的UV - 紫外线反射和真空沉积装置
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摘要
The present invention relates to a method for vacuum deposition of a surface of a reflector for air conditioner sterilization with improved UV-ultraviolet reflectance and a vacuum deposition apparatus therefor. In order to increase the deposition efficiency of the deposition source deposited on the surface of the material by sequentially forming a high vacuum after a low vacuum inside the chamber in which the material is disposed, the material injected with synthetic resin including plastic ( 10) preparing (S1); After removing the contaminants attached to the surface of the material 10, and etching the surface of the material 10 from which the contaminants are removed, a 0.17 to 0.20 μm undercoating layer ( Forming 20) (S2); UV drying after removing static electricity from the surface by spraying air and ions together on the surface of the material 10 on which the undercoating layer 20 is formed (S3); After the material 10 is placed in the chamber 90, a low vacuum is formed in the chamber 90 to reach 2.5×10 -2 torr by using a rotary pump 92 for vacuum deposition. maintaining for 3.5 hours (S4); After removing moisture and residual gas from the inside of the chamber 90 generated in the low-vacuum forming process with a vacuum pump 94, to improve the quality of the aluminum (Al) film through high-purity plasma formation, 6.5×10 -5 torr Forming a high vacuum to reach the step of maintaining 1-1.5 hours (S5); Aluminum (Al), which is the deposition source 80 prepared in the chamber 90, is heated by driving of the heater 96 and evaporated, rubbed against the surface of the undercoating layer 20 of the material 10 and then condensed into a thickness of 0.12 to 0.15 μm. Forming a vacuum deposition thin film layer 30 (S6); Forming a top coating layer 40 of 0.21 to 0.23 μm on the surface of the vacuum deposition thin film layer 30 by spraying a coating solution having a color on the surface of the material 10 on which the vacuum deposition thin film layer 30 is formed (S7); and making the inside of the chamber 90 in a state of 760 to 770 torr by using the rotary pump 92, and then taking out the work-completed material 10 (S8).
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