首页> 外国专利> VACUUM VAPOR DEPOSITION DEVICE, VACUUM VAPOR DEPOSITION METHOD, AND ORGANIC ELECTROLUMINESCENCE ELEMENT FORMED USING SAID VACUUM VAPOR DEPOSITION DEVICE OR VACUUM VAPOR DEPOSITION METHOD

VACUUM VAPOR DEPOSITION DEVICE, VACUUM VAPOR DEPOSITION METHOD, AND ORGANIC ELECTROLUMINESCENCE ELEMENT FORMED USING SAID VACUUM VAPOR DEPOSITION DEVICE OR VACUUM VAPOR DEPOSITION METHOD

机译:真空蒸气沉积设备,真空蒸气沉积方法以及使用所述真空蒸气沉积设备或真空蒸气沉积方法制成的有机电致发光元件

摘要

A vacuum vapor deposition device that forms by deposition, on top of the same surface of a member to be subjected to vapor deposition, a plurality of vapor deposition materials including at least a first vapor deposition material vapor deposited such that a concentration gradient is generated in the film thickness direction and a second vapor deposition material different to the first vapor deposition material and vapor deposited at a uniform concentration in the film thickness direction. The vacuum vapor deposition device comprises: a travel device that causes the member to be subjected to vapor deposition to travel; a first dispersal vessel that discharges the first vapor deposition material towards the member to be subjected to vapor deposition such that the concentration gradient is generated in the film thickness direction; and a second dispersal vessel that discharges a second vapor deposition material towards the member to be subjected to vapor deposition such that the uniform concentration is achieved in the film thickness direction.
机译:真空气相沉积装置,其通过在要进行气相沉积的构件的相同表面的顶部上沉积而形成多种气相沉积材料,所述多种气相沉积材料包括至少第一气相沉积材料,该第一气相沉积材料被气相沉积,从而在基板上产生浓度梯度。膜厚方向以及与第一蒸镀材料不同的第二蒸镀材料,在膜厚方向上以均匀的浓度蒸镀。该真空气相沉积装置包括:行程装置,该行程装置使要进行气相沉积的部件行进;第一分散容器,其将第一气相沉积材料朝向要进行气相沉积的构件排出,从而在膜厚方向上产生浓度梯度;第二分散容器,其向要进行气相沉积的构件排放第二气相沉积材料,从而在膜厚度方向上实现均匀的浓度。

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