Materials for forming an underlayer film, a resist underlayer film, a method for manufacturing a resist underlayer film, and a laminate

摘要

The material for forming an underlayer film of the present invention is a material for forming an underlayer film for forming a resist underlayer film used in a multilayer resist process, and has a repeating structural unit [A] represented by the following formula (1) and the following formula (2) a cyclic olefin polymer having the repeating structural unit [B] shown, wherein the molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is 5/95 It is more than 95/5 or less.