Optical system and method for performing photolithography using dynamic mask

摘要

The present invention provides a dynamic mask including a light source emitting light of a first wavelength and light of a second wavelength different from each other, reflecting the light incident from the light source and two-dimensionally arranged micromirrors, and reflection from the dynamic mask a substrate on which a photoresist is applied to form an image, a photoresist that causes a photochemical reaction with respect to the light of the second wavelength without causing a photochemical reaction with respect to the light of the first wavelength; a stage on which the substrate is mounted and movable up and down; and an imaging unit displaying an image formed on a surface of a photoresist on a substrate, wherein the image in which the light of the first wavelength is formed on the surface of the photoresist includes a path from the dynamic mask to the substrate while moving the stage up and down An optical system for performing photolithography is provided, which is used to focus an optical system, and wherein the light of the second wavelength is reflected by the dynamic mask and exposed to the photoresist surface to perform photolithography.