PLASMA DEPOSITION APPARATUS

摘要

A plasma deposition apparatus (100) comprising: a plasma chamber (10) for plasma deposition of a chemical on a substrate (200) in the plasma chamber; a thermal energizer (20) to thermally energize the chemical prior to plasma deposition in the plasma chamber; at least one radio frequency (RF) electrode (30) provided within the plasma chamber to energize by RF the thermally-energized chemical to a plasma state; and a guide screen (40) provided within the plasma chamber between the at least one RF electrode and the substrate to increase turbulence of flow of the chemical in plasma state from the at least one RF electrode to the substrate for deposition on the substrate of the chemical in plasma state with increased turbulence of flow.