首页> 外国专利> Method for growing β phase of gallium oxide (β-Ga2O3) single crystals from the melt contained within a metal crucible

Method for growing β phase of gallium oxide (β-Ga2O3) single crystals from the melt contained within a metal crucible

机译:从金属坩埚内含有的熔融溶液生长氧化镓([β] -Ga2O3)单晶的β相的方法

摘要

A method for growing beta phase of gallium oxide (β-Ga2O3) single crystals from the melt contained within a metal crucible surrounded by a thermal insulation and heated by a heater. A growth atmosphere provided into a growth furnace has a variable oxygen concentration or partial pressure in such a way that the oxygen concentration reaches a growth oxygen concentration value (C2, C2′, C2″) in the concentration range (SC) of 5-100 vol. % below the melting temperature (MT) of Ga2O3 or at the melting temperature (MT) or after complete melting of the Ga2O3 starting material adapted to minimize creation of metallic gallium amount and thus eutectic formation with the metal crucible. During the crystal growth step of the β-Ga2O3 single crystal from the melt at the growth temperature (GT) the growth oxygen concentration value (C2, C2′, C2″) is maintained within the oxygen concentration range (SC).
机译:一种氧化镓(β-Ga 2 o 3 )单晶从包含的金属坩埚中含有的氧化镓(β-ga 2 )单晶的方法,由隔热绝缘包围并加热加热器。提供给生长炉中的生长气氛具有可变的氧浓度或部分压力,使得氧浓度达到生长氧浓度值(C 2 / B>,C 2 ',c 2 “)在5-100 vol的浓度范围(sc)中。低于Ga 2 O 3 或在熔化温度(mt)的熔点或在Ga 2 3 启动材料,适于最小化金属镓量的产生,从而使金属坩埚的共晶形成。在β-ga 2的晶体生长步骤期间,从熔体处于生长温度(gt)生长氧浓度值(c 2)中的单晶(C 2 ,C 2 ',C 2 “)保持在氧浓度范围(SC)内。

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