Pressure reducing drying apparatus, vacuum drying system, and vacuum drying method

摘要

PROBLEM TO BE SOLVED: To provide a technique for drying a film applied on a substrate by decompressing the inside of a substrate storage part for storing the substrate such that a vaporized component from the film is suppressed from scattering out of the substrate storage part, the vaporized component is removed from the inside of the substrate storage part.SOLUTION: A decompression drying apparatus comprises: a support part which supports a substrate coated with a film; a substrate storage part which has a first cover part and a second cover part capable of contacting and leaving each other, and stores the substrate supported by the support part in a processing space between the first cover part and second cover part; a contacting/leaving drive part which while closing the processing space by making the first cover part and second cover part contact each other, opens the processing space by making the first cover part and second cover part leave each other; a decompression mechanism by drying the film applied on the substrate by decompressing the closed processing space; and an exhaust mechanism which is arranged outside the substrate storage part, and exhausts a vaporized component in the processing space through between peripheral edge parts of the first cover part and second cover part having left each other.SELECTED DRAWING: Figure 7