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Improvements relating to magnetic thin film elements for magnetic stores

机译:与用于磁性存储器的磁性薄膜元件有关的改进

摘要

A magnetic thin film element suitable for use in a magnetic store of the kind disclosed in Specification 1,045,572 comprises alternate layers of magnetizable material one having positive magnetostriction, the other having negative magnetostriction, and each being less than 2000A DEG thick. In particular the films are of NiFe alloy, those with positive magnetostriction having slightly less than 82% nickel, and those with negative magnetostriction having more than 82% nickel. The layers are deposited in grooves to give an element having an overall negative magnetostriction and a square hysteresis loop. In preparation two electro-plating baths are prepared, the first for negative magnetostriction comprising NiSO4, NaCl, boric acid, sodium lauryl sulphate and sodium saccharin, and the second for positie magnetostriction comprising this with the addition of ferrous ammonium sulphate. A grooved substrate is immersed in bath 1 with the groove at 22 1/2 DEG to an applied magnetic field, and plated for 15 seconds at 8mA/sq. cm. It is transferred to the second bath, again in the magnetic field, plated for 2 minutes at 2mA/sq. cm. and rinsed. The process is repeated 12 times giving an overall thickness of 10000A DEG -14000A DEG . Reference has been directed by the Comptroller to Specification 925,766.
机译:适用于在说明书1,045,572中公开的那种磁性存储器中的磁性薄膜元件包括可磁化材料的交替层,其中一层具有正的磁致伸缩,另一层具有负的磁致伸缩,且每层的厚度小于2000A。特别地,这些膜是NiFe合金的膜,具有正磁致伸缩的膜具有略小于82%的镍,并且具有负磁致伸缩的膜具有大于82%的镍。将这些层沉积在凹槽中,以提供具有整体负磁致伸缩和方形磁滞回线的元件。在准备过程中,准备了两个电镀液,第一个用于负磁致伸缩,包括NiSO4,NaCl,硼酸,十二烷基硫酸钠和糖精钠,第二个用于正磁致伸缩,包括添加亚硫酸铵的电镀。将开槽的基板浸入槽1中,使槽以22 1/2°的角度浸入磁场中,并以8mA / sq的速度电镀15秒钟。厘米。再次在磁场中将其转移到第二浴中,以2mA / sq的速度电镀2分钟。厘米。并冲洗干净。重复该过程12次,总厚度为10000A -14000AG。主计长已参考925,766规范。

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