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A method for aluminum - electroplating in salt melt

机译:一种在盐熔体中电镀铝的方法

摘要

1,240,183. Electro-plating with aluminium. NIPPON KOHAN K.K. Oct. 14, 1968 [Oct .25, 1967] No.48482/68. Heading C7B. A dense Al plating is electro-plated on to a metal (e.g. steel) substrate as cathode using an Al anode and a bath comprising a molten Al salt. The method includes the step of electrolytically oxidizing Al ions of low valency formed in the bath to trivalent Al ions by one of the following means: - (a) passing D. C. between a Pt plate anode and an independent Al cathode in the bath, (b) employing an Al rod as the anode or (c) passing A. C. between a Pt electrode and the substrate, e.g. a Pt wire coiled about the substrate. HCl gas may be blown into the bath during the plating operation. The electro-plating may be at a current density of 2A/ dmSP2/SP. In the Examples the baths are of (1) AlCl 3 , NaCl and KCl at 160‹C., (2) AlCl 3 and NaCl at 150‹C. and (3) AlCl 3 and NaCl at 160‹C.
机译:1,240,183。电镀铝。日本光汉公司1968年10月14日[1967年10月25日]第48482/68号。标题C7B。使用铝阳极和包含熔融铝盐的浴,将致密的铝镀层电镀到金属(例如钢)阴极上。该方法包括以下步骤之一,将镀液中形成的低价铝离子电解氧化为三价铝离子:-(a)使镀液中的铂板阳极和独立铝阴极之间通过直流电,(b )使用Al棒作为阳极,或(c)在Pt电极和基材之间通过AC,例如绕在基板上的铂丝。在电镀过程中,可能会将HCl气体吹入镀液中。电镀的电流密度可以为2A / dm 2 。在实施例中,浴是(1)160℃的AlCl 3,NaCl和KCl,(2)150℃的AlCl 3和NaCl。 (3)160℃下的AlCl 3和NaCl。

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