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Ohmics contacts of germanium and palladium alloy from group III-V n-type semiconductors

机译:III-V族n型半导体的锗和钯合金的欧姆接触

摘要

A metallization scheme for providing an ohmic contact to n- type III-V semiconductors is described. A metallurgical combination including germanium and palladium is formed on the semiconductor surface either in the form of an alloy or discrete layers. The structure is then heated so that the metallic and semiconductor components interdiffuse to establish the ohmic contact without melting of the metal. One advantage of such a solid state process is the high degree of dimensional control of the contact which is attainable.
机译:描述了用于向n型III-V半导体提供欧姆接触的金属化方案。在半导体表面上以合金或离散层的形式形成包括锗和钯的冶金组合。然后加热该结构,以使金属和半导体成分相互扩散,以建立欧姆接触而不会熔化金属。这种固态过程的一个优点是可以获得高度的接触尺寸控制。

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