Plasma cleaning device

摘要

Apparatus for cleaning contaminated surfaces such as hydro- carbon contaminant films in high vacuum environments including a plasma discharge housing for allowing a plasma to be generated in an environment having a higher pressure than the surface which is to be cleaned. A ground electrode and a radio frequency electrode partially surround a quartz plasma tube, for the introduction of an ionizable gas therein. These electrodes ionize the gas and help generate the plasma. This plasma flows through a non-constrictive aperture, through the plasma discharge housing and then on to the contaminated surface.