首页> 外国专利> Differential pressure gauge using semiconductor measuring diaphragm - has outer diaphragms forming chambers with supports connected to inner chamber housing measurement diaphragm

Differential pressure gauge using semiconductor measuring diaphragm - has outer diaphragms forming chambers with supports connected to inner chamber housing measurement diaphragm

机译:使用半导体测量膜片的差压表-具有形成腔室的外部膜片,其支撑件连接到内部腔室测量膜片

摘要

The differential pressure gauge has diaphragms exposed to the pressures to be measured. Pressures are transmitted by an incompressible liq. to a semiconductor diaphragm with low overload limit. Its deflection-proportional to the pressure difference is converted into an electric signal, and it is protected against excessive overload. Sides of the measurement cell (1) form, during overloads, supports (3, 3') for the diaphragms (4, 4'). Each of the chambers (5, 5')-limited by the diaphragm (4, 4') and the support (3, 3')-is connected with a compensation vol. (7, 7') consisting of a fixed wall (3, 3') and a common, springily-yielding central wall (10) of a compensation chamber (8) in the pressure gauge (1). The semiconductor measurement diaphragm (12) is mounted pref. at the centre of the middle wall (10) to form part of its surface.
机译:压差计的隔膜暴露在要测量的压力下。压力通过不可压缩的液体传递。低过载极限的半导体膜片。其与压力差成比例的变形被转换为电信号,并受到保护,以防止过度过载。在过载期间,测量单元(1)的侧面形成隔膜(4,4')的支撑(3,3')。由隔膜(4、4')和支撑件(3、3')限制的每个腔室(5、5')与补偿容积相连。 (7、7')由压力表(1)中的补偿室(8)的固定壁(3,3')和公用的,弹性屈服的中心壁(10)组成。预先安装了半导体测量膜片(12)。在中间壁(10)的中心形成其表面的一部分。

著录项

  • 公开/公告号FR2376407B1

    专利类型

  • 公开/公告日1982-03-05

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号FR19770038791

  • 发明设计人

    申请日1977-12-22

  • 分类号G01L13/06;

  • 国家 FR

  • 入库时间 2022-08-22 12:31:59

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