VACUUM DEPOSITING APPARATUS EQUIPPED WITH DEFLECTING AND REVERSELY ROTATING MECHANISM OF SUBSTRATE TO BE VAPOR DEPOSITED

摘要

PURPOSE:To make it possible to reversely rotate a substrate to be vapor deposited easily by a mechanism wherein a plurality of supporting elements supporting a substrate to be vapor deposited is supported along one circle by a rotating portion and a pinion gear fixed on each supporting element can be rotated and deflected against the rotating portion. CONSTITUTION:When an operating member 24 is retracted, a rotating portion 8 of a rotating plate 17 is rotated around a shaft line as a center by the rotation of a drive shaft 16 and a supporting element 19 of a substrate to be vapor deposited is rotated and transported to an evaporating position opposed to an evaporating source 5 while maintained in a constant angle. When the rotation of a shaft 16 is stopped and an operating member 24 is advanced and rotated, a ring like gear 22 is rotated against the rotation portion 8 and, because an inner teeth 23 are engaged with a pinion gear 21 fixed on a support element 19, all support elements 19 are synchronizingly rotated around a shaft line of a support element as a center in a constant angle corresponding to a rotating angle of the ring like gear 22. Therefore, the all support elements 19 against the rotating portion 8 is changed in a same angle and a substrate to be vapor deposited is successively vapor deposited on one surface thereof and, thereafter, reversely rotated.