首页> 外国专利> REVELER AND PROCESS FOR THE REVELATION OF NEGATIVE ACTION REPRODUCTION LAYERS

REVELER AND PROCESS FOR THE REVELATION OF NEGATIVE ACTION REPRODUCTION LAYERS

机译:揭露负作用复制层的揭示者和过程

摘要

Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.
机译:公开了一种用于曝光的,光敏的负性复制层的显影剂组合物,其可包含有机粘合剂,所述有机粘合剂包含水和取代的芳族羧酸的盐,特别是约5-60重量%的至少一种具有取代基的芳族羧酸的盐,所述取代基紧邻于羧基并且代表氨基,羟基和/或氯或溴。还公开了一种利用所公开的显影剂显影复制层的方法,其中复制层尤其包含具有缩醛,酸酐,酰胺和/或羧基的聚合物有机粘合剂。

著录项

  • 公开/公告号BR8205902A

    专利类型

  • 公开/公告日1983-09-06

    原文格式PDF

  • 申请/专利权人 HOECHST AG;

    申请/专利号BR19828205902

  • 发明设计人 SCHELL LONI;FRASS WERNER;GROS INGE;

    申请日1982-10-08

  • 分类号G03C5/24;G03F7/02;G03F7/26;

  • 国家 BR

  • 入库时间 2022-08-22 11:16:52

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