AQUEOUS-ALKALINE SOLUTION AND PROCESS FOR DEVELOPING POSITIVEWORKING REPRODUCTION LAYERS

摘要

PCT No. PCT/EP83/00205 Sec. 371 Date Apr. 11, 1984 Sec. 102(e) Date Apr. 11, 1984 PCT Filed Aug. 3, 1983 PCT Pub. No. WO84/00826 PCT Pub. Date Mar. 1, 1984.The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may further contain a salt of an organic, optionally substituted, aromatic monocarboxylic acid, for example, a benzoate. This solution is in particular used for developing reproduction layers which contain an o-naphthoquinone diazide as the radiation-sensitive compound and an alkali-soluble resin and which are applied to a support material based on aluminum, which comprises at least one aluminum oxide layer produced by anodic oxidation.